Brief Introduction of PECVD furnace systemPCVED by microwave or radio frequency make gas ionization containing film the constituent atoms,in a local plasma formation,and plasma chemical activity is very strong,is easy to react,sedimentary out the desired film on substrate,it widely used product high quality sio2 film,si3N4 film,diamond film,hard thin film,optical thin film and CNT etc.
Technical Parameter:

Split Tube furnace	· Input power: 208 – 240V AC, 1.2kW · 1200°C Max. working temperature for < 60 minutes · 1100°C Max for continuous heating · High purity quartz tube 2"OD x 1.7"ID x 39.4" Length · 30 segments programmable precision digital temperature controller 8" (200mm), single zone. 2.3" (60mm)
Plasma RF Generator	· Output Power: 5 -300W adjustable with ± 1% stability · RF frequency: 13.56 MHz ±0.005% stability · Reflection Power: 200W max. · Matching: Automatic · RF Output Port: 50 Ω, N-type, female · Noise: <50 dB. · Cooling: Air cooling. · Power : 208-240VAC, 50/60Hz
Vacuum Flange and Fittings	· Vacuum flange set is made of stainless steel 304. · Left flange assembly includes a KF-25 vacuum port, two KF-25 · quick clamp, · a KF-25 right angle valve, a KF-25 vacuum bellows, a flange · support 1/4 O.D · hose fitting, and a needle valve.
Vacuum Pump	· AC 220V 50 Hz 1/2HP 375W · 2 Liter /S or 120 liter/m Oil trap (inlet) and exhaust filter (outlet) are installed.
Warranty	One year limited warranty with lift time support (Consumable parts such as processing tubes, o-rings and heating elements are not covered by the warranty, please order the eplacement at related products below.)

We have a wide range of different optional function furnace to meet different heating requirement, also we accept customer design furnace R&D working, please email us your specific requirement, we will recommend most reasonable choice for you, thanks!